Repository landing page

We are not able to resolve this OAI Identifier to the repository landing page. If you are the repository manager for this record, please head to the Dashboard and adjust the settings.

Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers

Abstract

Applied Physics Letters77121840-1842APPL

Similar works

Full text

thumbnail-image

ScholarBank@NUS

redirect
Last time updated on 09/11/2016

This paper was published in ScholarBank@NUS.

Having an issue?

Is data on this page outdated, violates copyrights or anything else? Report the problem now and we will take corresponding actions after reviewing your request.